Measurement of magnetoresistance effect in nickel films deposited obliquely by thermal evaporation

Journal of Magnetism and Magnetic Materials

Volumn 92, Issue 1, 1990, Pages 68-74

  Hara, K ^a   Itoh, K ^a   Kamiya, M ^a   Fujiwara, H ^b   Okamoto, K ^c   Hashimoto, T ^d  

^a KUMAMOTO UNIVERSITY   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

^c CHIBA UNIVERSITY   (Japan)

^d TOTTORI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; MICROSCOPIC EXAMINATION; NICKEL AND ALLOYS--VAPOR DEPOSITION;

COLUMNAR GRAIN STRUCTURE; ELLIPSOMETRY; MAGNETORESISTANCE;

METALLIC FILMS;

EID: 0025522776     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/0304-8853(90)90680-O     Document Type: Article

References (29)

1. Negative Oblique-Incidence Anisotropy in Magnetostriction-Free Permalloy Films
2. Thin Solid Films
3. Analytical and numerical modeling of columnar evolution in thin films