Three-Dimensional Topography Simulation Model: Etching and Lithography

IEEE Transactions on Electron Devices

Volumn 37, Issue 10, 1990, Pages 2183-2192

  Fujinaga, Masato ^a   Kotani, Norihiko ^a   Kunikiyo, Tatsuya ^a   Oda, Hidekazu ^a   Shirahata, Masayoshi ^a   Akasaka, Yoichi ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ETCHING;

THREE-DIMENSIONAL TOPOGRAPHY;

LITHOGRAPHY;

EID: 0025505789     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.59908     Document Type: Article

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