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Volumn 33, Issue 8, 1990, Pages 1043-1048
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On the robustness of LDD nMOS transistors subjected to measurement of drain breakdown voltage
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC MEASUREMENTS--VOLTAGE;
SEMICONDUCTOR DEVICES, MOSFET;
SUBSTRATES;
DRAIN BREAKDOWN VOLTAGE;
LDD NMOS TRANSISTORS;
LIGHTLY DOPED DRAIN (LDD) MOSFET'S;
ROBUSTNESS;
SUBSTRATE RESISTANCE MEASUREMENT;
SUBTHRESHOLD CURRENT;
TRANSISTORS;
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EID: 0025472187
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/0038-1101(90)90218-4 Document Type: Article |
Times cited : (2)
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References (12)
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