Evaluation of correction accuracy of several schemes for AES matrix effect corrections

Surface and Interface Analysis

Volumn 15, Issue 8, 1990, Pages 466-472

  Tanuma, S ^a   Sekine, T ^a   Yoshihara, K ^a   Shimizu, R ^a   Homma, T ^a   Tokutaka, H ^a   Goto, K ^a   Uemura, M ^a   Fujita, D ^a   Kurokawa, A ^a   Ichimura, S ^a   Oshima, C ^a   Kurahashi, M ^a   Kudo, M ^a   Hashiguchi, Y ^a   Suzuki, T ^a   Ohmura, T ^a   Soeda, F ^a   Tanaka, K ^a   Tanaka, A ^a   Shiokawa, Y ^a   Hayashi, T ^a   more..

^a Innovative Materials Development Center   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS--SCATTERING; GOLD COPPER ALLOYS; MATHEMATICAL TECHNIQUES--ERROR ANALYSIS;

MATRIX EFFECT CORRECTIONS;

SPECTROSCOPY, AUGER ELECTRON;

EID: 0025468499     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.740150805     Document Type: Article

References (24)

1. Correction factors and sputtering effects in quantitative auger electron spectroscopy
2. Backscattering correction for quantitative Auger analysis III. A simple functional representation of electron backscattering factors