Preparation of Cubic Boron Nitride Films by RF Sputtering

Japanese Journal of Applied Physics

Volumn 29, Issue 7, 1990, Pages L1175-L1177

  Mieno, Masahiro ^a   Yoshida, Toyonobu ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Bias sputtering; Compressive stress; Cubic boron nitride; Infrared spectroscopy; Optical emission spectroscopy

Indexed keywords

ARGON; NITROGEN; SEMICONDUCTING SILICON; SPUTTERING; SUBSTRATES;

BORON NITRIDE; RF SPUTTERING;

BORON COMPOUNDS;

EID: 0025462188     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.29.L1175     Document Type: Article

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