Surface cleaning by electrostatic removal of particles

Aerosol Science and Technology

Volumn 13, Issue 1, 1990, Pages 116-123

  Cooper, Douglas ^a   Wolfe, Henry ^a   Yeh, James ^a   Miller, Robert ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTRONICS - QUALITY CONTROL; SEMICONDUCTING SILICON - DECONTAMINATION;

ELECTROSTATIC CLEANING; PARTICLE REMOVAL;

SEMICONDUCTOR DEVICE MANUFACTURE;

ARTICLE; CLEANING; ELECTROSTATIC PRECIPITATION; INDUSTRIAL HYGIENE; PARTICULATE MATTER; SURFACE CHARGE;

EID: 0025453343     PISSN: 02786826     EISSN: 15217388     Source Type: Journal    
DOI: 10.1080/02786829008959428     Document Type: Article

References (29)

1. Bansal, I. K. (1983). J. Environ. Sci. 26 (4): 20–23.
2. Bhattacharya, S., and Mittal, K. L. (1978). Surface Technol. 7:413–425.
3. Binnig, G., H. Rohrer, C. Gerber, and E. Weibel. (1982). Phys. Rev. Lett. 49:57.
4. Bowling, R. A. (1985). J. Electrochem. Soc. 132:2208–2214.
5. Chatterton, P. A. (1978). In Electrical Breakdown of Gases (J. M. Meek and J. D. Craggs, eds.). New York, Wiley, pp. 129–207.
6. Cooper, D. W., and H. L. Wolfe. (1990). Aerosol Sci. Technol. This issue.
7. Cooper, D. W., H. L. Wolfe, and R. J. Miller. (1988a). In Particles on Surfaces I: Detection, Adhesion, and Removal (K. L. Mittal, ed.). Plenum Press, New York, pp. 339–349.
8. Cooper, D. W., H. L. Wolfe, and J. T. C. Yeh. (1988b). “Electrostatic Removal of Contaminants,” U.S. Patent No. 4, 744, 833.
9. DeGeest, W. F. (1970). “Electrostatic Cleaner and Method,” U.S. Patent No. 3, 536, 5 28.
10. Felici, N.-J. (1966). Rev. Gen. Electr. 75:1145–1160.
11. Fine, F., and B. J. Pernick. (1987) Appl. Opt. 6:3172–3173.
12. Hartmann, G. C., L. M. Marks, and C. C. Yang. (1976). J. Appl. Phys. 47:5409–5420.
13. Hendricks, C. D. (1973). In Electrostatics and Its Applications (A. D. Moore, ed.). New York, Wiley, Chapter 2.
14. Hinds, W. C. (1982). Aerosol Technology, New York, Wiley.
15. Israelachvili, J. N. (1985). Intermolecular and Surface Forces, Academic Press, New York.
16. Lebedev, N. N., and I. P. Skal’skaya. (1962). Zh. Tekh. Fiz. 32:375–378.
17. McDaniel, J. B. (1964). Appl. Opt. 3:152–153.
18. Musselman, R. P., and T. W. Yarbrough. (1987). J. Environ. Sci. 30 (1): 51–56.
19. Novick, V. J., C. R. Hummer, and P. F. Dunn. (1989). J. Appl. Phys. 65:3242–3247.
20. Osburn, C. M., H. Berger, R. P. Donovan, and G. W. Jones. (1988). J. Environ. Sci. 31 (2): 45–57.
21. Rainford, R. E. (1986). Personal communication.
22. Ruzyllo, J. (1988). Microcontamination 6 (3): 39–43.
23. Sachar, K. S. (1975). IBM Tech. Discl. Bull. 18:1619–1621.
24. Saeki, H., J. Ikeda, I. Kohzu, and H. Ishimaru. (1989). J. Vac. Sci. Technol. A 7:2512–2514.
25. Shang, D. C. (1979). IBM Tech. Discl. Bull. 22:2696.
26. Shelkunova, Z. V., and S. V. Gegin. (1976). Zavod. Lab. 6:708–709.
27. Stowers, I. F. (1978). J. Vac. Sci. Technol. 15:751–754.
28. Young, D. R., and J. E. Thomas, Jr. (1964). IBM Tech. Discl. Bull. 7:181
29. Zimon, A. D. (1982). Adhesion of Dust and Powder, 2nd edn. Consultants Bureau (translation), New York.