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Volumn 137, Issue 6, 1990, Pages 1887-1892

The Evolution of Silicon Wafer Cleaning Technology

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; INTEGRATED CIRCUITS, VLSI; SURFACES - CLEANING;

EID: 0025445393     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2086825     Document Type: Article
Times cited : (1347)

References (71)
  • 2
    • 0014794693 scopus 로고
    • W. Kern, RCA Rev., 31, 207 (1970)
    • (1970) RCA Rev. , vol.31 , pp. 207
    • Kern, W.1
  • 3
    • 0001898753 scopus 로고
    • Thin Film Processes
    • J. L. Vossen and W. Kern, Editors, Chap. V-1, Academic Press, New York
    • W. Kern and C. A. Deckert, in “Thin Film Processes,” J. L. Vossen and W. Kern, Editors, Chap. V-1, p. 411, Academic Press, New York (1978).
    • (1978) , pp. 411
    • Kern, W.1    Deckert, C.A.2
  • 4
    • 0019541098 scopus 로고
    • P. F. Schmidt and C. W. Pierce, Journal of the Electrochemical Society, 128, 630 (1981)
    • (1981) , vol.128 , pp. 630
    • Schmidt, P.F.1    Pierce, C.W.2
  • 5
    • 0019710895 scopus 로고
    • Semiconductor Silicon 1981
    • PV 81-5, H. R. Huff, R. J. Kriegler, and Y. Takeishi, Editors, Pennington, NJ
    • W. T. Stacy, D. F. Allison, and T. C. Wu, in “Semiconductor Silicon 1981,” PV 81-5, H. R. Huff, R. J. Kriegler, and Y. Takeishi, Editors, p. 344, The Electrochemical Society Softbound Proceedings Series, Pennington, NJ (1981).
    • (1981) The Electrochemical Society Softbound Proceedings Series , pp. 344
    • Stacy, W.T.1    Allison, D.F.2    Wu, T.C.3
  • 8
    • 84975370401 scopus 로고
    • Semicon/Europe '86, Zurich, March 3–6
    • J. Ruzyllo, Technical Proc., Semicon/Europe '86, p. 10, Zurich, March 3–6, 1986.
    • (1986) Technical Proc. , pp. 10
    • Ruzyllo, J.1
  • 9
    • 0003951769 scopus 로고
    • Treatise on Clean Surface Technology
    • K. L. Mittal, Editor, Chap. 6, Plenum Press, New York
    • J. R. Monkowski, in “Treatise on Clean Surface Technology,” Vol. 1, K. L. Mittal, Editor, Chap. 6, p. 123, Plenum Press, New York (1987).
    • (1987) , vol.1 , pp. 123
    • Monkowski, J.R.1
  • 11
    • 5244255883 scopus 로고
    • The Chemistry of the Semiconductor Industry
    • S. J. Moss and A. Led-with, Editors, Chap. 11, and 242–243, Chapman and Hall, New York
    • W. Kern and G. L. Schnable, in “The Chemistry of the Semiconductor Industry,” S. J. Moss and A. Led-with, Editors, Chap. 11, pp. 235 and 242–243, Chapman and Hall, New York (1987).
    • (1987) , pp. 235
    • Kern, W.1    Schnable, G.L.2
  • 12
    • 0042281719 scopus 로고
    • Particles on Surfaces 1: Detection, Adhesion, and Removal
    • K. L. Mittal, Editor, Plenum Press, New York
    • A. Khilnani, in “Particles on Surfaces 1: Detection, Adhesion, and Removal,” K. L. Mittal, Editor, pp. 17–35, Plenum Press, New York (1988).
    • (1988) , pp. 17-35
    • Khilnani, A.1
  • 16
    • 0014800632 scopus 로고
    • W. Kern, RCA Rev., 31, 234 (1970)
    • (1970) RCA Rev. , vol.31 , pp. 234
    • Kern, W.1
  • 17
    • 84975412233 scopus 로고
    • Wafer Cleaning Equipment, 1986 Master Buying Guide
    • “Wafer Cleaning Equipment, 1986 Master Buying Guide,” Semicond. Int., 8 (13), 76 (1986)
    • (1986) Semicond. Int. , vol.8 , Issue.13 , pp. 76
  • 18
    • 84975431708 scopus 로고
    • Wafer Cleaning Equipment, 1986 Master Buying Guide
    • K. Skidmore, “Wafer Cleaning Equipment, 1986 Master Buying Guide,” Semicond. Int., 9 (9), 80 (1987)
    • (1987) Semicond. Int. , vol.9 , Issue.9 , pp. 80
    • Skidmore, K.1
  • 19
    • 84975431702 scopus 로고
    • Wafer Cleaning Equipment, 1986 Master Buying Guide
    • P. H. Singer, “Wafer Cleaning Equipment, 1986 Master Buying Guide,” Semicond. Int., 11 (8), 42 (1988)
    • (1988) Semicond. Int. , vol.11 , Issue.8 , pp. 42
    • Singer, P.H.1
  • 20
    • 0010317576 scopus 로고
    • Wafer Cleaning Equipment, 1986 Master Buying Guide
    • D. Burkman, “Wafer Cleaning Equipment, 1986 Master Buying Guide,” Semicond. Int., 4 (7), 103 (1981)
    • (1981) Semicond. Int. , vol.4 , Issue.7 , pp. 103
    • Burkman, D.1
  • 23
    • 84975438872 scopus 로고
    • Stationary In Situ Wet Chemical Processing: The Impact on Wafer Surface Phenomena
    • 1988 Microcontamination Conference, Santa Clara, CA; for a summary of this paper see
    • A. E. Walter and C. F. McConnell, “Stationary In Situ Wet Chemical Processing: The Impact on Wafer Surface Phenomena,” 1988 Microcontamination Conference, Santa Clara, CA; for a summary of this paper see Semicond. Int., 12 (1), 36 (1989)
    • (1989) Semicond. Int. , vol.12 , Issue.1 , pp. 36
    • Walter, A.E.1    McConnell, C.F.2
  • 24
    • 84975363006 scopus 로고
    • R. C. Henderson, Journal of the Electrochemical Society, 119, 772 (1972)
    • (1972) , vol.119 , pp. 772
    • Henderson, R.C.1
  • 25
    • 0015665776 scopus 로고
    • R. L. Meek, T. M. Buck, and C. F. Gibbon, Journal of the Electrochemical Society, 120, 1241 (1973)
    • (1973) , vol.120 , pp. 1241
    • Meek, R.L.1    Buck, T.M.2    Gibbon, C.F.3
  • 29
    • 84975391147 scopus 로고
    • D. A. Peters and C. A. Deckert, Journal of the Electrochemical Society, 126, 883 (1979)
    • (1979) , vol.126 , pp. 883
    • Peters, D.A.1    Deckert, C.A.2
  • 32
    • 0020777708 scopus 로고
    • July/August
    • W. Kern, RCA Engineer, 28, 99 (July/August 1983).
    • (1983) RCA Engineer , vol.28 , pp. 99
    • Kern, W.1
  • 37
    • 0022699183 scopus 로고
    • A. Ishizaka and Y. Shiraki, Journal of the Electrochemical Society, 133, 666 (1986)
    • (1986) , vol.133 , pp. 666
    • Ishizaka, A.1    Shiraki, Y.2
  • 40
    • 84975428956 scopus 로고
    • Microelectronics Processing: Inorganic Materials Characterization
    • L. A. Casper, Editor, Chap. 23, American Chemical Society, Washington, DC
    • D. S. Becker, W. R. Schmidt, C. A. Peterson, and D. Burkman, in “Microelectronics Processing: Inorganic Materials Characterization,” ACS Symposium Series No. 295, L. A. Casper, Editor, Chap. 23, p. 368, American Chemical Society, Washington, DC (1986).
    • (1986) ACS Symposium Series , Issue.295 , pp. 368
    • Becker, D.S.1    Schmidt, W.R.2    Peterson, C.A.3    Burkman, D.4
  • 44
    • 0023324713 scopus 로고
    • G. Gould and E. A. Irene, Journal of the Electrochemical Society, 174, 1031 (1987)
    • (1987) , vol.174 , pp. 1031
    • Gould, G.1    Irene, E.A.2
  • 45
    • 84975438550 scopus 로고    scopus 로고
    • J. Ruzyllo, Journal of the Electrochemical Society, p. 1869.
    • Ruzyllo, J.1
  • 47
    • 84882772831 scopus 로고
    • Particles on Surfaces 1: Detection, Adhesion, and Removal
    • K. L. Mittal, Editor, Plenum Press, New York
    • C. A. Peterson, in “Particles on Surfaces 1: Detection, Adhesion, and Removal,” K. L. Mittal, Editor, p. 37, Plenum Press, New York (1988).
    • (1988) , pp. 37
    • Peterson, C.A.1
  • 50
    • 0024639632 scopus 로고
    • G. Gould and E. A. Irene, Journal of the Electrochemical Society, 136, 1108 (1989)
    • (1989) , vol.136 , pp. 1108
    • Gould, G.1    Irene, E.A.2
  • 56
    • 0011768216 scopus 로고
    • Particles on Surfaces 1: Detection, Adhesion, and Removal
    • K. L. Mittal, Editor, Plenum Press, New York
    • J. Bardina, in “Particles on Surfaces 1: Detection, Adhesion, and Removal,” K. L. Mittal, Editor, p. 329, Plenum Press, New York (1988).
    • (1988) , pp. 329
    • Bardina, J.1
  • 60
    • 84975438493 scopus 로고    scopus 로고
    • (1989) (this is a summary of work reported by D.-B. Kao et al.)
    • P. Burggraaf, Semicond. Int., 11 (8), 15 (1989) (this is a summary of work reported by D.-B. Kao et al.).
    • Semicond. Int. , vol.11 , Issue.8 , pp. 15
    • Burggraaf, P.1
  • 61
    • 0003951769 scopus 로고
    • Treatise on Clean Surface Technology
    • K. L. Mittal, Editor, Chap. 1, Plenum Press, New York
    • J. R. Vig, in “Treatise on Clean Surface Technology,” Vol. 1, K. L. Mittal, Editor, Chap. 1, Plenum Press, New York (1987).
    • (1987) , vol.1
    • Vig, J.R.1
  • 62
    • 0023401592 scopus 로고
    • J. Ruzyllo, G. T. Duranko, and A. M. Hoff, Journal of the Electrochemical Society, 134, 2052 (1987)
    • (1987) , vol.134 , pp. 2052
    • Ruzyllo, J.1    Duranko, G.T.2    Hoff, A.M.3
  • 65
    • 0343983090 scopus 로고
    • Particles on Surfaces 1: Detection, Adhesion, and Removal
    • K. L. Mittal, Editor, Plenum Press, New York
    • S. A. Hoenig, in “Particles on Surfaces 1: Detection, Adhesion, and Removal,” K. L. Mittal, Editor, p. 3, Plenum Press, New York (1988).
    • (1988) , pp. 3
    • Hoenig, S.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.