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Volumn 33, Issue 5, 1990, Pages 171-175
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In situ end point control of photoresist development
a
a
Xinix Inc
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(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
LITHOGRAPHY--PHOTOLITHOGRAPHY;
PHOTOMETRY--APPLICATIONS;
END POINT DETECTOR;
PHOTORESISTS;
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EID: 0025432793
PISSN: 0038111X
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (8)
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References (9)
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