Deep uv optics for excimer laser systems

Microelectronic Engineering

Volumn 11, Issue 1-4, 1990, Pages 187-195

  Goodall, Francis N ^a   Lawes, Ronald A ^a   Arthur, Graham G ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING--LASER APPLICATIONS; LITHOGRAPHY; METAL CUTTING--MICROMACHINING; ULTRAVIOLET RADIATION;

CATADIOPTRIC SYSTEMS; DIFFRACTION LIMITED IMAGERY; LASER CHEMICAL PROCESSING; MICROMACHINING; PROJECTION OPTICS; UV OPTICS;

LASERS, EXCIMER;

EID: 0025419235     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(90)90096-C     Document Type: Article

References (4)

1. Reduction Photolithography by Ablation at wavelength 193 nm
2. Excimer Lasers as Deep UV Sources for Photolithographic System
3. Excimer Laser Lithography