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Volumn 11, Issue 4, 1990, Pages 171-173

75-GHz fT SiGe-Base Heterojunction Bipolar Transistors

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON;

EID: 0025419030     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.61782     Document Type: Article
Times cited : (396)

References (14)
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  • 2
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  • 3
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  • 4
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    • Mar.
    • T. Tatsumi, H. Hirayama, and N. Aizaki, “Si/Ge0.3Si0.7/Si heterojunction bipolar transistor made with Si molecular beam epitaxy,” Appl. Phys. Lett., vol. 52, pp. 895–897, Mar. 1988.
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  • 5
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    • H. Temkin, J. C. Bean, A. Antreasyan, and R. Leibenguth, “GexSi1−x strained-layer heterostructure bipolar transistors,” Appl. Phys. Lett., vol. 52, pp. 1089–1091, Mar. 1988.
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  • 6
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    • Feb.
    • C. A. King et al., “Si/Si1−xGex heterojunction bipolar transistors produced by limited reaction processing,” IEEE Electron Device Lett., vol. 10, pp. 52–54, Feb. 1989.
    • (1989) IEEE Electron Device Lett. , vol.10 , pp. 52-54
    • King, C.A.1
  • 7
    • 0024921925 scopus 로고
    • Graded-SiGe-base, poly-emitter heterojunction bipolar transistors
    • Dec.
    • G. L. Patton et al., “Graded-SiGe-base, poly-emitter heterojunction bipolar transistors,” IEEE Electron Device Lett., vol. 10, pp. 534– 536, Dec. 1989.
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    • Patton, G.L.1
  • 8
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  • 9
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    • Dec.
    • S. E. Fischer et al., “A 45 GHz Ge/Si heterojunction bipolar transistor fabricated with low temperature epi,” in IEDM Tech. Dig., Dec. 1989, pp. 890–892.
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  • 10
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  • 14
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.