Preparation and Properties of Ta2O5 Films by LPCVD for ULSI Application

Journal of the Electrochemical Society

Volumn 137, Issue 4, 1990, Pages 1297-1300

  Zaima, Shigeaki ^a   Furuta, Takeshi ^a   Yasuda, Yukio ^a   Iida, Makio ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b DENSO CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS--THIN FILMS; FILMS--CHEMICAL VAPOR DEPOSITION; OXIDES; TANTALUM COMPOUNDS;

LOW-PRESSURE CHEMICAL VAPOR DEPOSITION; TANTALUM PENTOXIDE;

SEMICONDUCTING SILICON;

EID: 0025418031     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2086651     Document Type: Article

References (11)

1. Y. Nishioka, N. Homma, H. Shinriki, K. Mukai, K. Yamaguchi, A. Uchida, K. Higeta, and K. Ogiue, IEEE Trans. Electron Devices, ED-34, 1957 (1987).
2. G. S. Oehrlein and A. Reisman, J. Appl. Phys., 54, 6502 (1983).
3. B. W. Shen, I. C. Chen, S. Banerjee, G. A. Brown, P. H. Chang, and R. R. Doering, 1987 IEDM Tech. Dig., 582 (1987).
4. C. Hashimoto and H. Oikawa, Extended Abstracts of the 17th Conference on Solid State Devices and Materials, p. 275, Tokyo (1985).
5. S. Kimura, Y. Nishioka, A. Shintani, and K. Mukai, Journal of the Electrochemical Society, 130, 2414 (1983).
6. H. Shinriki, Y. Nishioka, Y. Ohji, and K. Mukai, 1986 IEDM Tech. Dig., 684 (1986).
7. C. Hashimoto, H. Oikawa, and N. Honma, Extended Abstracts of the 18th Conference on Solid State Devices and Materials, p. 253, Tokyo (1986).
8. M. Saitoh, T. Mori, and H. Tamura, 1986 IEDM Tech. Dig., 680 (1986).
9. Y. Nishioka, S. Kimura, H. Shinriki, and K. Mukai, Journal of the Electrochemical Society, 134, 410 (1987).
10. S. Seki, T. Unagami, and O. Kogore, Journal of the Electrochemical Society, 131, 2457 (1984).
11. Y. Tarui, S. Oka, M. Matsui, K. Yamagishi, and K. Kuroiwa, Extended Abstracts of 19th Conference on Solid State Devices and Materials, p. 219, Tokyo (1987).