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Volumn 37, Issue 4, 1990, Pages 1081-1086

Experimental Transient Analysis of the Tunnel Current in EEPROM Cells

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC MEASUREMENTS; SEMICONDUCTOR DEVICES--TUNNELING;

EID: 0025416877     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.52445     Document Type: Article
Times cited : (46)

References (13)
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    • Lenzlinger, M.1    Snow, E.H.2
  • 3
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    • Modeling of write/erase and charge retention of floating gate EEPROM device
    • A. Bhattacharyya, “Modeling of write/erase and charge retention of floating gate EEPROM device,” Solid State Electron., vol. 27, p. 899, 1984.
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    • Bhattacharyya, A.1
  • 5
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    • SPICE model for transient analysis of EEPROM cells
    • Sept.
    • R. Bez, D. Cantarelli, P. Cappelletti, and F. Maggioni, “SPICE model for transient analysis of EEPROM cells,” J. de Physique, C4, sup. 9, vol. 49, pp. 677–680, Sept. 1988.
    • (1988) J. de Physique, C4 , vol.49 , pp. 677-680
    • Bez, R.1    Cantarelli, D.2    Cappelletti, P.3    Maggioni, F.4
  • 6
    • 0020833511 scopus 로고
    • Creation and termination of substrate deep depletion in thin oxide MOS capacitors by charge tunneling
    • M. S. Liang, C. Chang, Y. T. Yeow, C. Hu, and R. W. Brodersen, “Creation and termination of substrate deep depletion in thin oxide MOS capacitors by charge tunneling,” IEEE Electron Device Lett., vol. EDL-10, p. 350, 1983.
    • (1983) IEEE Electron Device Lett. , vol.EDL-10 , pp. 350
    • Liang, M.S.1    Chang, C.2    Yeow, Y.T.3    Hu, C.4    Brodersen, R.W.5
  • 7
    • 33747969525 scopus 로고
    • Electron scattering by pair production in silicon
    • E. O. Kane, “Electron scattering by pair production in silicon,” Phys. Rev., vol. 159, p. 624, 1967.
    • (1967) Phys. Rev. , vol.159 , pp. 624
    • Kane, E.O.1
  • 8
    • 36849105555 scopus 로고
    • MOS avalanche and tunneling effects in silicon surfaces
    • A. Goetzberger and E. H. Nico11ian, “MOS avalanche and tunneling effects in silicon surfaces,” J. Appl. Phys., vol. 4, p. 4582, 1967.
    • (1967) J. Appl. Phys. , vol.4 , pp. 4582
    • Goetzberger, A.1    Nico11ian, E.H.2
  • 9
    • 0024170319 scopus 로고
    • An accurate model of subbreakdown due to band-to-band to-band tunneling and its application
    • R. Shirota et al., “ An accurate model of subbreakdown due to band-to-band to-band tunneling and its application,” in IEDM Tech. Dig., 1988, pp. 26–29.
    • (1988) IEDM Tech. Dig. , pp. 26-29
    • Shirota, R.1
  • 11
    • 0019561675 scopus 로고
    • Positive and negative charging of thermally grown SiO2 induced by Fowler-Nordheim emission
    • M. Itsumi, “Positive and negative charging of thermally grown SiO2 induced by Fowler-Nordheim emission,” J. Appl. Phys., vol. 52, p. 3491, 1981.
    • (1981) J. Appl. Phys. , vol.52 , pp. 3491
    • Itsumi, M.1
  • 12
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    • Electrical conduction and dielectric breakdown in silicon dioxide films on silicon
    • C. M. Osburn and E. M. Weizman, “Electrical conduction and dielectric breakdown in silicon dioxide films on silicon,” J. Elec. Soc., vol. 119, p. 603, 1972.
    • (1972) J. Elec. Soc. , vol.119 , pp. 603
    • Osburn, C.M.1    Weizman, E.M.2
  • 13
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    • Impact ionization and positive charge in thin SiO2 films
    • M. Shatzkes and M. Av-Ron, “Impact ionization and positive charge in thin SiO2 films,” J. Appl. Phys., vol. 43, p. 3191, 1976.
    • (1976) J. Appl. Phys. , vol.43 , pp. 3191
    • Shatzkes, M.1    Av-Ron, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.