-
1
-
-
0039956433
-
Generalized guide for MOSFET miniaturization
-
Jan.
-
J. R. Brews, W. Fichtner, E. H. Nicollian, and S. M. Sze, “Generalized guide for MOSFET miniaturization,” IEEE Electron Device Lett., vol. EDL-1, pp. 2–4, Jan. 1980.
-
(1980)
IEEE Electron Device Lett.
, vol.EDL-1
, pp. 2-4
-
-
Brews, J.R.1
Fichtner, W.2
Nicollian, E.H.3
Sze, S.M.4
-
2
-
-
0022306901
-
Extremely high transconductance (above 500 mS/mm) MOSFET with 2.5 nm gate oxide
-
Dec.
-
S. Horiguchi, T. Kobayashi, M. Miyake, M. Oda, and K. Kiuchi, “Extremely high transconductance (above 500 mS/mm) MOSFET with 2.5 nm gate oxide,” in IEDM Tech. Dig., Dec. 1985, pp. 761–763. 763.
-
(1985)
IEDM Tech. Dig.
, pp. 761-763
-
-
Horiguchi, S.1
Kobayashi, T.2
Miyake, M.3
Oda, M.4
Kiuchi, K.5
-
3
-
-
36749112620
-
Two components of tunneling current in metal-oxide-semiconductor structures
-
July
-
B. Eitan and A. Kolodny, “Two components of tunneling current in metal-oxide-semiconductor structures,” Appl. Phys. Lett., vol. 43, pp. 106–108, July 1983.
-
(1983)
Appl. Phys. Lett.
, vol.43
, pp. 106-108
-
-
Eitan, B.1
Kolodny, A.2
-
4
-
-
84939030468
-
The influence of degeneracy in the channel on long-channel MOSFET characteristics
-
Dec.
-
B. Majkusiak, A. Jakubowski, and L. Łukasiak, “The influence of degeneracy in the channel on long-channel MOSFET characteristics,” IEEE Trans. Electron Devices, vol. ED-34, pp. 2560–2561, Dec. 1987.
-
(1987)
IEEE Trans. Electron Devices
, vol.ED-34
, pp. 2560-2561
-
-
Majkusiak, B.1
Jakubowski, A.2
Łukasiak, L.3
-
5
-
-
0009678557
-
On electron tunneling in the metal-insulator-semiconductor systems including various electron effective masses
-
Oct.
-
B. Majkusiak and A. Jakubowski, “On electron tunneling in the metal-insulator-semiconductor systems including various electron effective masses,” J. Appl. Phys., vol. 58, pp. 3141–3144, Oct. 1985.
-
(1985)
J. Appl. Phys.
, vol.58
, pp. 3141-3144
-
-
Majkusiak, B.1
Jakubowski, A.2
-
6
-
-
0001162780
-
-
S. Mugge, Ed. Berlin: Springer
-
W. Franz, in Handbook Der Physik, S. Mugge, Ed. Berlin: Springer, 1956, vol. 17, p. 155.
-
(1956)
Handbook Der Physik
, vol.17
, pp. 155
-
-
Franz, W.1
-
7
-
-
0020163706
-
On tunneling in metal-oxide-silicon structures
-
July
-
Z. A. Weinberg, “On tunneling in metal-oxide-silicon structures,” J. Appl. Phys., vol. 53, pp. 5052–5056, July 1982.
-
(1982)
J. Appl. Phys.
, vol.53
, pp. 5052-5056
-
-
Weinberg, Z.A.1
-
8
-
-
0016126266
-
Tunneling in thin MOS structures
-
J. Maserjian, “Tunneling in thin MOS structures,” J. Vac. Sci. Technol., vol. 11, pp. 996–1003, 1974.
-
(1974)
J. Vac. Sci. Technol.
, vol.11
, pp. 996-1003
-
-
Maserjian, J.1
-
9
-
-
0020902148
-
Carrier tunneling related phenomena in thin oxide MOSFET’s
-
Dec.
-
C. Chang, M.-S. Liang, C. Hu, and R. W. Brodersen, “Carrier tunneling related phenomena in thin oxide MOSFET’s,” in IEDM Tech. Dig., pp. 194–197, Dec. 1983.
-
(1983)
IEDM Tech. Dig.
, pp. 194-197
-
-
Chang, C.1
Liang, M.-S.2
Hu, C.3
Brodersen, R.W.4
-
10
-
-
0023438561
-
Valence band electron tunneling in metal-oxide-silicon structures
-
A. Modelli, “Valence band electron tunneling in metal-oxide-silicon structures,” Appl. Surf Sci., vol. 30, pp. 298–303, 1987.
-
(1987)
Appl. Surf. Sci.
, vol.30
, pp. 298-303
-
-
Modelli, A.1
-
11
-
-
0019553010
-
Electron tunneling at Al-SiO2 interfaces
-
Apr.
-
M. Av-Ron, M. Shatzkes, T. H. DiStefano, and R. A. Gdula, “Electron tunneling at Al-SiO2 interfaces,” J. Appl. Phys., vol. 52, pp. 2897–2908, Apr. 1981.
-
(1981)
J. Appl. Phys.
, vol.52
, pp. 2897-2908
-
-
Av-Ron, M.1
Shatzkes, M.2
DiStefano, T.H.3
Gdula, R.A.4
-
12
-
-
0001175728
-
Transmission, photoconductivity, and the experimental bandgap of thermally grown SiO2 films
-
Mar.
-
Z. A. Weinberg, G. W. Rubloff, and E. Bassous, “Transmission, photoconductivity, and the experimental bandgap of thermally grown Si0 2 films,” Phys. Rev. B, vol. 19, pp. 3107–3117, Mar. 1979.
-
(1979)
Phys. Rev. B
, vol.19
, pp. 3107-3117
-
-
Weinberg, Z.A.1
Rubloff, G.W.2
Bassous, E.3
-
13
-
-
0022688857
-
Inversion-layer capacitance and mobility of very thin gate-oxide MOSFET’s
-
Mar.
-
M.-S. Liang, J. Y. Choi, P.-K. Ko, and C. Hu, “Inversion-layer capacitance and mobility of very thin gate-oxide MOSFET’s,” IEEE Trans. Electron Devices, vol. ED-33, pp. 409–413, Mar. 1986.
-
(1986)
IEEE Trans. Electron Devices
, vol.ED-33
, pp. 409-413
-
-
Liang, M.-S.1
Choi, J.Y.2
Ko, P.-K.3
Hu, C.4
-
14
-
-
36549091508
-
Evaluation of interface potential barrier heights between ultrathin silicon oxides and silicon
-
Aug.
-
S. Horiguchi and H. Yoshino, “Evaluation of interface potential barrier heights between ultra thin silicon oxides and silicon,” J. Appl. Phys., vol. 58, pp. 1597–1600, Aug. 1985.
-
(1985)
J. Appl. Phys.
, vol.58
, pp. 1597-1600
-
-
Horiguchi, S.1
Yoshino, H.2
-
15
-
-
84907835044
-
Investigation of the Al ultrathin SiO2-Si system by comparison of theoretical and experimental current-voltage characteristics
-
(Bologna, Italy), Sept.
-
B. Majkusiak, A. Jakubowski, and A. Swit, “Investigation of the Al ultrathin SiO2-Si system by comparison of theoretical and experimental current-voltage characteristics,” in Proc. ESSDERC 87 (Bologna, Italy), Sept. 1987, pp. 683–686.
-
(1987)
Proc. ESSDERC 87
, pp. 683-686
-
-
Majkusiak, B.1
Jakubowski, A.2
Swit, A.3
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