Yields of the Plasma Oxidation of Silicon by Neutral Oxygen Atoms and Negative Oxygen Atom Ions

Journal of the Electrochemical Society

Volumn 137, Issue 2, 1990, Pages 628-631

  Vinckier, C ^a   De Jaegere, S ^a  

^a Laboratory for Analytical and Inorganic Chemistry ^*  (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS--REACTION KINETICS; OXYGEN; PLASMAS; SILICA;

PLASMA ANODIZATION; PLASMA OXIDATION; SILICON DIOXIDE;

SEMICONDUCTING SILICON;

EID: 0025383420     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2086519     Document Type: Article

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