메뉴 건너뛰기




Volumn 25, Issue 1, 1990, Pages 36-41

A Circuit Design to Suppress Asymmetrical Characteristics in High-Density DRAM Sense Amplifiers

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFIERS - DESIGN; INTEGRATED CIRCUITS - LAYOUT; TRANSISTORS, FIELD EFFECT;

EID: 0025382946     PISSN: 00189200     EISSN: 1558173X     Source Type: Journal    
DOI: 10.1109/4.50281     Document Type: Article
Times cited : (11)

References (9)
  • 1
    • 0003686062 scopus 로고
    • A 16Mb DRAM with an open bit-line architecture
    • Feb.
    • M. Inoue et. all., “A 16Mb DRAM with an open bit-line architecture,” in ISSCC Dig. Tech. Papers, Feb. 1988. pp. 246–247.
    • (1988) ISSCC Dig. Tech. Papers , pp. 246-247
    • Inoue, M.1
  • 2
    • 0022690260 scopus 로고
    • A new half-micrometer p-channel MOSFET with efficient punchthrough stops
    • Mar.
    • S. Odanaka et. al., “A new half-micrometer p-channel MOSFET with efficient punchthrough stops,” IEEE Trans. Electron Devices. vol. ED-33, no. 3, pp. 317–321, Mar. 1986.
    • (1986) IEEE Trans. Electron Devices , vol.ED-33 , Issue.3 , pp. 317-321
    • Odanaka, S.1
  • 3
    • 84941859588 scopus 로고
    • An effect of oblique ion implantation on DRAM sense amplifier
    • Apr.
    • H. Tanaka et. al., “An effect of oblique ion implantation on DRAM sense amplifier.” in Spring Nat. Conv. Rec. IEIEE, C-330, Apr. 1988, p. 291.
    • (1988) Spring Nat. Conv. Rec. IEIEE , vol.C-330 , pp. 291
    • Tanaka, H.1
  • 4
    • 33746418853 scopus 로고
    • Improvement of asymmetrical characteristics in submicron CMOS devices
    • part C. May
    • T. Yabu et. al., “Improvement of asymmetrical characteristics in submicron CMOS devices,” Trans. IEIEE, part C. pp. 456–462, May 1989.
    • (1989) Trans. IEIEE , pp. 456-462
    • Yabu, T.1
  • 5
    • 0022326761 scopus 로고
    • Analysis of LDD transistor asymmetry susceptibility in VLSI circuits
    • Dec.
    • Y. Oowaki et. all., “Analysis of LDD transistor asymmetry susceptibility in VLSI circuits,” in IEDM Tech. Dig., Dec. 1985. pp. 492–495.
    • (1985) IEDM Tech. Dig , pp. 492-495
    • Oowaki, Y.1
  • 6
    • 0023535931 scopus 로고
    • The improvement of LDD MOSFETs characteristics by the oblique-rotating ion implantation
    • July
    • T. Eimori et. all., “The improvement of LDD MOSFETs characteristics by the oblique-rotating ion implantation,” in 19th Conf. Solid State Devices and Materials Extended Abstr., July 1987, pp. 27–30.
    • (1987) 19th Conf. Solid State Devices and Materials Extended Abstr , pp. 27-30
    • Eimori, T.1
  • 7
    • 0016047227 scopus 로고
    • Optimization of the latching pulse for dynamic flip flop sensors
    • Apr.
    • W. T. Lynch et. al., “Optimization of the latching pulse for dynamic flip flop sensors.” IEEE J. Solid-State Circuits, vol. SC-9, pp. 49–55, Apr. 1974.
    • (1974) IEEE J. Solid-State Circuits , vol.SC-9 , pp. 49-55
    • Lynch, W.T.1
  • 8
    • 0019665278 scopus 로고
    • A new sense amplifier technique for VLSI dynamic RAMs
    • Dec.
    • T. Furuyama et. all., “A new sense amplifier technique for VLSI dynamic RAMs,” in IEDM Tech. Dig., Dec. 1981, pp. 44–47.
    • (1981) IEDM Tech. Dig , pp. 44-47
    • Furuyama, T.1
  • 9
    • 0024882641 scopus 로고
    • A circuit design to suppress asymmetrical characteristics in 16-Mbit DRAM sense amplifier
    • May
    • H. Yamauchi et. all., “A circuit design to suppress asymmetrical characteristics in 16-Mbit DRAM sense amplifier,” in Synip. VLSI Circuit Tch. Dig., May 1989, pp. 109–110.
    • (1989) Synip. VLSI Circuit Tch. Dig , pp. 109-110
    • Yamauchi, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.