Future of thermal plasma processing

Transactions of the Japan Institute of Metals

Volumn 30, Issue 1, 1990, Pages 1-11

  Yoshida, Toyonobu ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

POWDERS--SYNTHESIS; SILICON NITRIDE--REVIEWS;

PLASMA FLASH EVAPORATION; PLASMA SPRAYING; RADIO FREQUENCY PROCESSING; REACTIVE QUENCHING; SUPERHIGH RATE DEPOSITION; THERMAL PLASMA PROCESSING;

CERAMIC MATERIALS;

EID: 0025207454     PISSN: 00214434     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans1989.31.1     Document Type: Article

References (13)