Charge Trapping in Dielectrics Grown on Polycrystalline Silicon

Journal of the Electrochemical Society

Volumn 136, Issue 12, 1989, Pages 3786-3790

  Liang, M S ^a   Radjy, N ^a   Cox, W ^a   Cagnina, S ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS--GROWING; FILMS--DIELECTRIC; SILICA--DIELECTRIC PROPERTIES;

CHARGE TRAPPING; FLOATING-GATE MEMORY DEVICES; INTERLEVEL DIELECTRICS; POLYCRYSTALLINE SILICON; THERMAL OXIDE GROWN;

SEMICONDUCTING SILICON;

EID: 0024937025     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2096548     Document Type: Article

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