Advanced 0.5 μm CMOS disposable LDD spacer technology

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1989, Pages 31-32

  Parrillo, Louis C ^a   Pfiester, James R ^a   Lin, Jung Hui ^a   Travis, Edward O ^a   Sivan, Richard D ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE;

CMOS TECHNOLOGY; LDD (LIGHTLY DOPED DRAIN) SPACER; NMOS; PMOS; SALICIDE SPACERS;

SEMICONDUCTOR DEVICES, MOS;

EID: 0024933157     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)