Study of boron penetration through thin oxide with p+-polysilicon gate

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1989, Pages 17-18

  Sun, J Y C ^a   Wong, C ^a   Taur, Y ^a   Hsu, C H ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CAPACITORS; INTEGRATED CIRCUITS, VLSI; SEMICONDUCTOR DEVICES, MOS;

BORON PENETRATION; CMOS DEVICES; CMOS ULSI; PASSIVATION; POLY GATE CAPACITORS; POLYSILICON;

SEMICONDUCTING SILICON;

EID: 0024930239     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)