Purification of P2+ beam and anti-punch-through implantation of P-channel MOSFET

Vacuum

Volumn 39, Issue 2-4, 1989, Pages 209-210

  Jin hua, Li ^a   Yi ming, Pan ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

PHOSPHORUS; SEMICONDUCTOR DEVICES, MOSFET--ION IMPLANTATION;

CMOSFET; PHOSPHORUS IONS; PUNCHTHROUGH IMPLANTATION;

ION BEAMS;

EID: 0024929981     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0042-207X(89)90198-X     Document Type: Article

References (3)

1. Discharge of P2+ ions in the beamline of medium current implanters