Ta2O5 plasma CVD technology for DRAM stacked capacitors

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1989, Pages 43-46

  Numasawa, Y ^a   Kamiyama, S ^a   Zenke, M ^a   Sakamoto, M ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC BREAKDOWN; PLASMAS; SEMICONDUCTING SILICON--PLASMAS;

DRAM; POLYSILICON; STACKED CAPACITORS; TIME-DEPENDENT DIELECTRIC BREAKDOWN;

DATA STORAGE, DIGITAL;

EID: 0024918847     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)