Low-temperature APCVD oxide using TEOS-ozone chemistry for multilevel interconnections

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1989, Pages 669-672

  Kotani, H ^a   Matsuura, M ^a   Fujii, A ^a   Genjou, H ^a   Nagao, S ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; SEMICONDUCTOR MATERIALS;

APCVD (ATMOSPHERIC-PRESSURE CHEMICAL VAPOR DEPOSITION); INTERLAYER DIELECTRIC; MULTILEVEL INTERCONNECTIONS; SUBMICRON DEVICES;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0024918838     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)