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Volumn 10, Issue 12, 1989, Pages 585-587

Reduction of the Surface Recombination Current in InGaAs/InP Pseudo-Heterojunction Bipolar Transistors Using a Thin InP Passivation Layer

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0024910851     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.43148     Document Type: Article
Times cited : (28)

References (14)
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  • 3
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  • 4
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  • 5
    • 0001066838 scopus 로고
    • DC characterization of the AlGaAs/GaAs tunneling emitter bipolar transistor
    • F. E. Najjar et al., ‘‘DC characterization of the AlGaAs/GaAs tunneling emitter bipolar transistor,” Appl. Phys. Lett., vol. 50, pp. 1915–1917, 1987.
    • (1987) Appl. Phys. Lett. , vol.50 , pp. 1915-1917
    • Najjar, F.E.1
  • 7
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    • Super-gain AlGaAs/GaAs heterojunction bipolar transistors using an emitter edge-thinning design
    • H.H. Lin and S.C. Lee, ‘‘Super-gain AlGaAs/GaAs heterojunction bipolar transistors using an emitter edge-thinning design,” Appl. Phys. Lett., vol. 47, pp. 839–841, 1985.
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  • 8
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    • Effect of emitter-base spacing on the current gain of AlGaAs/GaAs heterojunction bipolar transistors
    • W.S. Lee, D. Ueda, T. Ma, T.C. Pao, and J. S. Harris, Jr., ‘‘Effect of emitter-base spacing on the current gain of AlGaAs/GaAs heterojunction bipolar transistors,” IEEE Electron Device Lett., vol. 10, pp. 200–202, 1989.
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    • Lee, W.S.1    Ueda, D.2    Ma, T.3    Pao, T.C.4    Harris, J.S.5
  • 9
    • 0022811433 scopus 로고
    • InGaAs/InP double-heterostructure bipolar transistors with near-ideal versus Ic characteristic
    • R. N. Nottenburg, H. Temkin, M. B. Panish, R. Bhat, and J. C. Bischoff, “InGaAs/InP double-heterostructure bipolar transistors with near-ideal β versus I c characteristic,” IEEE Electron Device Lett., vol. EDL-7, pp. 643–645, 1986.
    • (1986) IEEE Electron Device Lett. , vol.EDL-7 , pp. 643-645
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  • 10
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    • Planar type vapor-phase epitaxial In0.53Ga0.47As photodiode
    • N. Susa, Y. Yamauchi, H. Ando, and H. Kanabe, “Planar type vapor-phase epitaxial In 0.53 Ga 0.47 As photodiode,” IEEE Electron Device Lett., vol. EDL-1, pp. 55–57, 1980.
    • (1980) IEEE Electron Device Lett. , vol.EDL-1 , pp. 55-57
    • Susa, N.1    Yamauchi, Y.2    Ando, H.3    Kanabe, H.4
  • 11
    • 0021156782 scopus 로고
    • Polyimide passivation of In0.53Ga0.47As, InP, and InGaAsP/InP p-n junction structures
    • R. Yeats and K. Von Dessonneck, “Polyimide passivation of In 0.53 Ga 0.47 As, InP, and InGaAsP/InP p-n junction structures,” Appl. Phys. Lett., vol. 44, pp. 145–147, 1984.
    • (1984) Appl. Phys. Lett. , vol.44 , pp. 145-147
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  • 12
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    • Surface passivation techniques for InP and InGaAsP p-n junction structures
    • V. Diadiuk, C. A. Armiento, S. H. Groves, and C. E. Hurwitz, “Surface passivation techniques for InP and InGaAsP p-n junction structures,” IEEE Electron Device Lett., vol. EDL-1, pp. 177–178, 1980.
    • (1980) IEEE Electron Device Lett. , vol.EDL-1 , pp. 177-178
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  • 13
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    • Plasma enhanced CVD Si3N4 film applied to InP avalanche photodiodes
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    • (1980) Japan. J. Appl. Phys. , vol.19 , pp. 1675-1678
    • Susa, N.1    Kanbe, H.2    Ando, H.3    Ohmachi, Y.4
  • 14
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    • Crystallographic dependence of dynamic conductance in GaInAs/InP photodiodes grown by OMVPE
    • June (Boston, MA)
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    • Carey, K.W.1    Wang, S.Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.