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Surface and Coatings Technology

Volumn 39-40, Issue C, 1989, Pages 355-363

The effect of N2 partial pressure, deposition rate and substrate bias potential on the hardness and texture of reactively sputtered TiN coatings

(3) Sproul, W D a Rudnik, P J a Graham, M E a

a NORTHWESTERN UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS--CHEMICAL VAPOR DEPOSITION; NITRIDES--TEXTURES; SPUTTERING;

REACTIVE SPUTTERING; TITANIUM NITRIDE; VICKERS MICROHARDNESS;

COATINGS;

EID: 0024904429 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/0257-8972(89)90068-6 Document Type: Article

Times cited : (66)

References (24)

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6
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.