Selective chemical vapor deposition of copper

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1989, Pages 103-104

  Awaya, Nobuyoshi ^a   Arita, Yoshinobu ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER AND ALLOYS--THIN FILMS; SEMICONDUCTOR DEVICE MANUFACTURE;

DOUBLE-LEVEL INTERCONNECTIONS; METAL SILICIDE; VIA HOLES;

SEMICONDUCTOR MATERIALS;

EID: 0024901457     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)