A two-dimensional thermal oxidation simulator using visco-elastic stress analysis

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1989, Pages 695-698

  Saito, N ^a   Miura, H ^a   Sakata, S ^a   Ikegawa, M ^a   Shimizu, T ^a   Masuda, H ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; SEMICONDUCTING SILICON;

SHALLOW TRENCH; SOFTWARE PACKAGE OXSIM2D; THERMAL OXIDATION; VISCO-ELASTIC STRESS ANALYSIS; WHITE RIBBON EFFECT;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0024870442     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)