Process Dependence of Hole Trapping in Thin Nitrided SiO2 Films

IEEE Transactions on Electron Devices

Volumn 36, Issue 11, 1989, Pages 2447-2451

  Severi, Maurizio ^a   Impronta, Maurizio ^a   Guerri, Sergio ^a   Dori, Leonello ^a  

^a CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS--DIELECTRIC; HEAT TREATMENT--NITRIDING; SEMICONDUCTOR DEVICES, MIS; SEMICONDUCTOR MATERIALS--CHARGE CARRIERS;

AVALANCHE INJECTION; GATE INSULATORS; HOLE TRAPPING; NITRIDATION; NITRIDED OXIDES; VLSI;

SILICA;

EID: 0024771027     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.43665     Document Type: Article

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