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Volumn 17, Issue 5, 1989, Pages 705-712

Principles and Applications of Vacuum Arc Coatings

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; DIAMONDS; METALS AND ALLOYS; PLASMAS--TRANSPORT PROPERTIES;

EID: 0024751356     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.41186     Document Type: Article
Times cited : (109)

References (75)
  • 1
    • 0006929963 scopus 로고
    • L. Holland, Nature, vol. 178, p. 328, 1956.
    • (1956) Nature , vol.178 , pp. 328
    • Holland, L.1
  • 28
    • 84941486281 scopus 로고
    • presented at the, St. Louis, MO, Paper 8201–081.
    • H. Brandolf, presented at the ASM Metals Cong., St. Louis, MO, 1982, Paper 8201–081.
    • (1982) ASM Metals Cong.
    • Brandolf, H.1
  • 30
    • 84941466403 scopus 로고    scopus 로고
    • Cathodic arc plasma deposition processes and their applications
    • to be published.
    • H. Randhawa and P. C. Johnson, “Cathodic arc plasma deposition processes and their applications,” Surface and Coat. Technol., to be published.
    • Surface and Coat. Technol.
    • Randhawa, H.1    Johnson, P.C.2
  • 31
    • 84941464682 scopus 로고
    • Ti(x)-Al(l - x) N films deposited by ion plating with the arc-evaporator
    • (San Diego, CA)
    • H. Freller and H. Haessler, “Ti(x)-Al(l - x) N films deposited by ion plating with the arc-evaporator,” in Proc. Int. Conf. Metal. Coat. (San Diego, CA), 1987, p. 70.
    • (1987) Proc. Int. Conf. Metal. Coat , pp. 70
    • Freller, H.1    Haessler, H.2
  • 32
    • 84941481154 scopus 로고
    • TiN, ZrN, and HfN films deposited by arc vapor ion deposition (AVID)
    • (San Diego, CA)
    • O. A. Johansen, P. H. Lee, J. Dontje, and R. L. D. Zenner, “TiN, ZrN, and HfN films deposited by arc vapor ion deposition (AVID),” in Proc. Int. Conf. Metal. Coat. (San Diego, CA), 1987, p. 70.
    • (1987) Proc. Int. Conf. Metal. Coat , pp. 70
    • Johansen, O.A.1    Lee, P.H.2    Dontje, J.3    Zenner, R.L.D.4
  • 33
    • 84941485358 scopus 로고    scopus 로고
    • Controlled vacuum arc material deposition, method and apparatus
    • S. Ramalingam, C. B. Qi, and K. Kim, “Controlled vacuum arc material deposition, method and apparatus,” U.S. Patent application.
    • U.S. Patent application
    • Ramalingam, S.1    Qi, C.B.2    Kim, K.3
  • 35
    • 84941454513 scopus 로고    scopus 로고
    • private communication, July 27, (test report on sample supplied by authors)
    • P. J. Martin, private communication, July 27, 1987 (test report on sample supplied by authors).
    • Martin, P.J.1
  • 36
    • 84941464942 scopus 로고
    • Effect of crystallographic orientation on erosion characteristics of arc evaporation titanium nitride coating
    • (San Diego, CA)
    • J. A. Sue and H. H. Troue, “Effect of crystallographic orientation on erosion characteristics of arc evaporation titanium nitride coating,” in Proc. Int. Conf. Metal. Coat. (San Diego, CA), 1987, p. 82.
    • (1987) Proc. Int. Conf. Metal. Coat , pp. 82
    • Sue, J.A.1    Troue, H.H.2
  • 39
    • 0001578452 scopus 로고
    • Deposition and characterization of ternary nitrides
    • part 2, pp. May-June
    • H. Randhawa, P. C. Johnson, and R. Cunningham, “Deposition and characterization of ternary nitrides,” J. Vac. Sci. Technol., vol. 6, no. 3, part 2, pp. 2136–2139, May-June 1988.
    • (1988) J. Vac. Sci. Technol. , vol.6 , Issue.3 , pp. 2136-2139
    • Randhawa, H.1    Johnson, P.C.2    Cunningham, R.3
  • 40
    • 84941455734 scopus 로고
    • Hard coatings of TiN, TiN, (TiHf) N and (TiNb) N deposited by random and steered arc evaporation
    • (San Diego, CA)
    • S. Boelens, H. Veltrop, and H. Wesemeyer, “Hard coatings of TiN, (TiHf) N and (TiNb) N deposited by random and steered arc evaporation,” in Proc. Int. Conf. Metal Coat. (San Diego, CA), 1987, p. 76.
    • (1987) Proc. Int. Conf. Metal Coat , pp. 76
    • Boelens, S.1    Veltrop, H.2    Wesemeyer, H.3
  • 41
    • 84941465678 scopus 로고
    • Deposition, structure and properties of ternary nitrides of Ti, Zr, and Hf with nitrogen and molybdenum nitrides produced with steed arc coating
    • (San Diego, CA)
    • S. Ramalingam, K. Kim, and R. F. Chang, “Deposition, structure and properties of ternary nitrides of Ti, Zr, and Hf with nitrogen and molybdenum nitrides produced with steed arc coating,” in Proc. Int. Cong. Metal Coat. (San Diego, CA), 1987, p. 91.
    • (1987) Proc. Int. Cong. Metal Coat , pp. 91
    • Ramalingam, S.1    Kim, K.2    Chang, R.F.3
  • 51
    • 84941433933 scopus 로고
    • A large volume, metal ion plasma system for coaling and ion surface modification research
    • San Diego, CA)
    • W. Anderson, R. Gutierrez, D. Dixon, and P. Kidd, “A large volume, metal ion plasma system for coaling and ion surface modification research,” in Proc. Int. Conf. Metal. Coat. (San Diego, CA), 1987, p. 107.
    • (1987) Proc. Int. Conf. Metal. Coat. , pp. 107
    • Anderson, W.1    Gutierrez, R.2    Dixon, D.3    Kidd, P.4
  • 56
    • 84941450412 scopus 로고    scopus 로고
    • Federal Republic of Germany Patent Disclosure DE 3 413 891 A1, Oct. 17
    • H. Ehrich, Federal Republic of Germany Patent Disclosure DE 3 413 891 A1, Oct. 17, 1985.
    • Ehrich, H.1
  • 60
    • 0024751355 scopus 로고    scopus 로고
    • A model for a uniform steady-state vacuum arc with a hot anode
    • this issue
    • R. Boxman and S. Goldsmith, “A model for a uniform steady-state vacuum arc with a hot anode,” IEEE Trans. Plasma Sci., this issue, pp. 661–665.
    • IEEE Trans. Plasma Sci. , pp. 661-665
    • Boxman, R.1    Goldsmith, S.2
  • 63
    • 0003440353 scopus 로고
    • J. Lafferty, Ed. New York: Wiley
    • L. P. Harris, in Vacuum Arcs J. Lafferty, Ed. New York: Wiley, 1980, p. 120.
    • (1980) Vacuum Arcs , pp. 120
    • Harris, L.P.1
  • 69
    • 0024749340 scopus 로고    scopus 로고
    • Angular distribution of ion current emerging from an aperture anode in a vacuum arc
    • this issue
    • Y. Cohen, R. L. Boxman, and S. Goldsmith, “Angular distribution of ion current emerging from an aperture anode in a vacuum arc,” IEEE Trans. Plasma Sci., this issue, pp. 713–716.
    • IEEE Trans. Plasma Sci. , pp. 713-716
    • Cohen, Y.1    Boxman, R.L.2    Goldsmith, S.3
  • 72
    • 84941439972 scopus 로고    scopus 로고
    • Characteristics of Ti arc evaporation processes
    • to be published.
    • P. J. Martin et al., “Characteristics of Ti arc evaporation processes,” Thin Solid Films, to be published.
    • Thin Solid Films
    • Martin, P.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.