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Applied Surface Science

Volumn 39, Issue 1-4, 1989, Pages 178-191

ONO technology

(2) Honlein W a Reisinger, H a

a SIEMENS AG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; DIELECTRIC MATERIALS--THIN FILMS; SILICA; SILICON NITRIDE;

OXIDE-NITRIDE-OXIDE (ONO) DIELECTRICS; THERMAL OXIDES; THIN CAPACITOR DIELECTRICS;

SEMICONDUCTING SILICON;

EID: 0024749708 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(89)90432-7 Document Type: Article

Times cited : (23)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.