The Low-Temperature Anodization of Silicon in a Gaseous Plasma

IEEE Transactions on Electron Devices

Volumn 36, Issue 7, 1989, Pages 1279-1285

  Barlow, Kenneth J ^a   Taylor, Stephen ^a   Eccleston, William ^a   Kiermasz, A ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

HALOGEN COMPOUNDS; MASS SPECTROMETERS--APPLICATIONS; OXIDES; PLASMAS;

GASEOUS PLASMA; LOW TEMPERATURE ANODIZATION; MICROWAVE OXYGEN PLASMAS; QUADROPOLE MASS SPECTROMETRY; RF PLASMAS;

SEMICONDUCTING SILICON;

EID: 0024705927     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.30933     Document Type: Article

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