Chemical vapor deposition of silicon dioxide barrier layers for conductivity enhancement of tin oxide films

Journal of Materials Research

Volumn 4, Issue 4, 1989, Pages 863-872

  Ellis, Frank B ^a   Houghton, Jim ^a  

^a Chronar Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING FILMS--ELECTRIC CONDUCTIVITY; SEMICONDUCTING TIN COMPOUNDS--DOPING;

ATMOSPHERIC CHEMICAL VAPOR DEPOSITION; CONDUCTIVITY ENHANCEMENT; SILICA THIN FILM DEPOSITION; SILICON DIOXIDE BARRIER LAYERS; SODA LIME GLASS; TIN OXIDE FILMS;

SILICA;

EID: 0024701240     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1989.0863     Document Type: Article

References (8)

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8. N. Goldsmith and W. Kern, RCA Rev. 28, 153 (1967).