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Volumn 36, Issue 6, 1989, Pages 1182-1188

Collector-Base Junction Avalanche Effects in Advanced Double-Poly Self-Aligned Bipolar Transistors

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS;

EID: 0024683097     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.24366     Document Type: Article
Times cited : (104)

References (13)
  • 1
    • 0018505201 scopus 로고
    • Bipolar transistor design for optimized power-delay logic circuits
    • D. D. Tang and P. M. Solomon, “Bipolar transistor design for optimized power-delay logic circuits,” IEEEJ. Solid-State Circuits, vol. SC-14, no. 4, 1979.
    • (1979) IEEE J. Solid-State Circuits , vol.SC-14 , Issue.4
    • Tang, D.D.1    Solomon, P.M.2
  • 2
  • 4
    • 0024088423 scopus 로고
    • A subnanosecond 5-kbit bipolar ECL RAM
    • Oct.
    • C. T. Chuang et al., “A subnanosecond 5-kbit bipolar ECL RAM.” IEEEJ. Solid-State Circuits, vol. 23, Oct. 1988.
    • (1988) IEEE J. Solid-State Circuits , vol.23
    • Chuang, C.T.1
  • 6
    • 0023401391 scopus 로고
    • Methodology for bipolar process diagnosis and its application to advanced self-aligned bipolar transistors
    • G. P. Li, E. Hackbarth, C. T. Chuang, D. D. Tang, and T. C. Chen, “Methodology for bipolar process diagnosis and its application to advanced self-aligned bipolar transistors,” IEEE Trans. Electron Devices, vol. ED-34, no. 11, pp. 2246–2254, 1987.
    • (1987) IEEE Trans. Electron Devices , vol.ED-34 , Issue.11 , pp. 2246-2254
    • Li, G.P.1    Hackbarth, E.2    Chuang, C.T.3    Tang, D.D.4    Chen, T.C.5
  • 7
    • 84939323589 scopus 로고    scopus 로고
    • Improved transistor structure and method of fabrication
    • U.S. Patent 3 312 881; U.S. Patent Re27 045 Feb.
    • H. N. Yu, “Improved transistor structure and method of fabrication,” U.S. Patent 3 312 881; U.S. Patent Re27 045, Feb. 1971.
    • Yu, H.N.1
  • 8
    • 84913767339 scopus 로고
    • Experimental evaluation of high energy ion implantation gradients for possible fabrication of a transistor pedestal collector
    • Nov.
    • J. F. Ziegler, B. L. Crowder, and W. J. Kleinfelder, “Experimental evaluation of high energy ion implantation gradients for possible fabrication of a transistor pedestal collector,” IBM J. Res. Develop., vol. 15, p. 452, Nov. 1971.
    • (1971) IBM J. Res. Develop , vol.15 , pp. 452
    • Ziegler, J.F.1    Crowder, B.L.2    Kleinfelder, W.J.3
  • 9
    • 0023568692 scopus 로고
    • A 20 ps/G Si bipolar IC using advanced SST with collector ion implantation
    • (Tokyo)
    • S. Konaka, Y. Amemiya, K. Sakuma, and T. Sakai, “A 20 ps/G Si bipolar IC using advanced SST with collector ion implantation,” in Extended Abstracts I9th Conf. on SSDM (Tokyo), 1987, pp. 331 — 334.
    • (1987) Extended Abstracts I9th Conf. on SSDM , pp. 331-334
    • Konaka, S.1    Amemiya, Y.2    Sakuma, K.3    Sakai, T.4
  • 10
    • 0024611752 scopus 로고
    • A reduced-field design concept for highperformance bipolar transistors
    • Feb.
    • D. D. Tang, P.-F. Lu, “A reduced-field design concept for highperformance bipolar transistors,” IEEE Electron Device Lett., vol. 10, p. 67, Feb. 1989.
    • (1989) IEEE Electron Device Lett , vol.10 , pp. 67
    • Tang, D.D.1    Lu, P.-F.2
  • 12
    • 0019596416 scopus 로고
    • Finite element analysis of semiconductor devices: The FIELDAY program
    • July
    • E. M. Buturla, P. E. Cottrel, B. M. Grossman, and K. A. Salsburg, “Finite element analysis of semiconductor devices: The FIELDAY program,” IBM J. Res. Develop., vol. 25, pp. 218–231, July 1981.
    • (1981) IBM J. Res. Develop , vol.25 , pp. 218-231
    • Buturla, E.M.1    Cottrel, P.E.2    Grossman, B.M.3    Salsburg, K.A.4
  • 13
    • 0022062026 scopus 로고
    • Advanced bipolar modeling: Process and device simulation tools for today’s technology
    • R. W. Knepper, S. P. Gaur, F. Y. Chang, and G. R. Srinivasan, “Advanced bipolar modeling: Process and device simulation tools for today’s technology,” IBM J. Res. Develop., vol, 29, no. 3, 1985.
    • (1985) IBM J. Res. Develop , vol.29 , Issue.3
    • Knepper, R.W.1    Gaur, S.P.2    Chang, F.Y.3    Srinivasan, G.R.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.