Structuring of polyimide by ArF excimer laser ablation

Semiconductor Science and Technology

Volumn 4, Issue 6, 1989, Pages 486-490

  Spiess, W ^a   Strack, H ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON FLUORIDE; PROXIMITY ABLATION;

ARGON; LASERS, EXCIMER--APPLICATIONS; MICROSCOPIC EXAMINATION--SCANNING ELECTRON MICROSCOPY;

POLYIMIDES;

EID: 0024682311     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/4/6/011     Document Type: Article

References (21)

1. Laser ablation of polymers
2. Clearing resist from alignment mark areas using an excimer laser
3. Very large scale integrated pattern registration improvement by photoablation of resist-covered alignment targets
4. Excimer laser photoablation of silicon