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Volumn 36, Issue 6, 1989, Pages 1102-1109

A Simulation Study of High-Speed Silicon Heteroemitter Bipolar Transistors

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON;

EID: 0024681269     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.24354     Document Type: Article
Times cited : (20)

References (14)
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  • 2
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  • 4
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    • I-V characteristics of oxygen-doped Si epitaxial film (OXSEF)/Si heterojunctions
    • M. Takahashi, M. Tabe, and Y. Sakakibara, “I-V characteristics of oxygen-doped Si epitaxial film (OXSEF)/Si heterojunctions,” IEEE Electron Device Lett., vol. EDL-8, pp. 47–48, 1987.
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  • 5
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  • 6
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    • Molecular beam epitaxial growth off GaP on Si
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    • Wright, S.L.1    Kroemer, H.2    Inada, M.3
  • 7
    • 0022077676 scopus 로고
    • An amorphous SiC : H emitter heterojunction transistor
    • K. Sasaki, M. M. Rahman, and S. Furukawa, “An amorphous SiC : H emitter heterojunction transistor,” IEEE Electron Device Lett., vol. EDL-6, pp. 311–312, 1984.
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  • 8
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  • 9
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  • 10
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  • 13
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.