Compositional disordering of In0.53Ga0.47As/In0.52Al0.48As multiquantum well structures by repetitive rapid thermal annealing

Japanese Journal of Applied Physics

Volumn 28, Issue 5A, 1989, Pages L730-L733

  Miyazawa, Takeo ^a   Suzuki, Yasuhiro ^a   Kawamura, Yuichi ^a   Asai, Hiromitsu ^a   Mikami, Osamu ^a  

^a NTT CORPORATION   (Japan)

Author keywords

Dopant free disordering; Lno0.53Gao0.47As Ino52Al0.48As MQW; Optical transmission; Photoluminescence; Repetitive rapid thermal annealing

Indexed keywords

HEAT TREATMENT--ANNEALING; LIGHT--TRANSMISSION; PHOTOLUMINESCENCE;

COMPOSITIONAL DISORDERING; INDIUM ALUMINUM ARSENIDE; INDIUM GALLIUM ARSENIDE; MULTIQUANTUM WELL STRUCTURES; OPTICAL TRANSMISSION; RAPID THERMAL ANNEALING;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0024666163     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.28.L730     Document Type: Article

References (16)

1. W. D. Laidig, N. Holonyak, Jr., M. D. Camras, K. Hess, J. J. Coleman, P. D. Dapkus and J. Bardeen: Appl. Phys. Lett. 38 (1981) 776.
2. H. Nakashima, S. Semura, T. Ohta, Y. Uchida, H. Saito, T. Fukuzawa, T. Kuroda and K. L. I. Kobayashi: IEEE J. Quantum Electron. QE-21 (1985) 629.
3. K. Meehan, N. Holonyak, Jr., J. M. Brown, M. A. Nixon, P. Gavrilovic and R. D. Burnham: Appl. Phys. Lett. 45 (1984) 549.
4. D. G. Deppe, L. J. Guido, N. Holonyak, Jr. K. C. Hsieh, R. D. Burnham, R. L. Thornton and T. L. Paoli: Appl. Phys. Lett. 49 (1986) 510.
5. J. D. Ralston, S. O’Brien, G. W. Wicks and L. F. Eastoman: Apl. Phys. Lett. 52 (1988) 1511.
6. J. E. Epler, R. D. Burnham, P. L. Thornton, T. L. Paoii and M. C. Bashaw: Appl. Phys. Lett. 49 (1986) 1447.
7. K. K. Anderson, J. P. Donnelly, C. A. Wang, J. D. Woodhouse, and H. A. Haus: Appl. Phys. Lett. 53 (1988) 1632.
8. Y. Kawamura, H. Asahi, A. Kohzen and K. Wakita: Electron. Lett. 21 (1985) 218.
9. T. Miyazawa, Y. Kawamura and O. Mikami: Jpn. J. Appl. Phys. 27 (1988) L1731.
10. R. J. Baird, T. J. Potter, R. Lai, G. P. Kothiyal and P. K. Bhattacharya: Appl. Phys. Lett 53 (1988) 2302.
11. J. Y. Chi, E. S. Koteles and R. P. Holmstrom: Appl. Phys. Lett. 53 (1988) 2185.
12. K. Nakashima, Y. Kawaguchi, Y. Kawamura, Y. Imamura and H. Asahi: Appl. Phys. Lett. 52 (1988) 1383.
13. B. Tell, B. C. Jonson, J. I. Zyskind, J. M. Brown, J. W. Sulhoff, K. F. Brown-Goebeler, B. I. Miller and U. Koren: Appl. Phys. Lett. 52 (1988) 1428.
14. Y. Kawamura, K. Wakita and H. Asahi: Electron Lett. 21 (1985) 371.
15. A. Usami, Y. Tokuda, H. Shiraki, U. Ueda, T. Wada, H. Kan and T. Murakami: Mat. Res. Soc. Symp. Proc. 92 (1987) 394.
16. J. Kobayashi, M. Nakajima, Y. Banmba, T. Fukunaga, K. Matsui, K. Ishida, H. Nakashima and K. Ishida: Jpn. J. Appl. Phys. 25 (1986) L. 385.