Structure development in epoxy resin modified with poly(ether sulphone)

Polymer

Volumn 30, Issue 4, 1989, Pages 662-667

  Yamanaka, Keizo ^a   Inoue, Takashi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

adhesive strength; connected globule structure; epoxy resin; light scattering; poly(ether sulphone); spinodal decomposition

Indexed keywords

EPOXY RESINS - LIGHT SCATTERING; PLASTICS - CURING; POLYETHERS; POLYSULFONES;

ADHESIVE STRENGTH; CONNECTED GLOBULE STRUCTURE; DIAMINODIPHENYLMETHANE; POLY(ETHER SULFONES); SPINODAL DECOMPOSITION;

POLYMERS;

EID: 0024649715     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/0032-3861(89)90151-1     Document Type: Article

References (15)

1. Toughening mechanisms in elastomer-modified epoxies
2. Compatibilizer-aided toughening in polymer blends consisting of brittle polymer particles dispersed in a ductile polymer matrix
3. The miscibility of polyethersulfone with phenoxy resin
4. Photographic Light Scattering by Polyethylene Films