Study of Electrochemical Etch-Stop for High-Precision Thickness Control of Silicon Membranes

IEEE Transactions on Electron Devices

Volumn 36, Issue 4, 1989, Pages 663-669

  Kloeck, Ben ^a   Collins, Scott D ^a   De Rooij, Nico F ^a   Smith, Rosemary L ^b  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MEMBRANES--ETCHING; PIEZOELECTRIC TRANSDUCERS; PRESSURE TRANSDUCERS; SENSORS;

PIEZORESISTIVE PRESSURE SENSORS; SILICON MEMBRANES; THICKNESS CONTROL; WET ANISOTROPIC ETCHING;

SEMICONDUCTING SILICON;

EID: 0024647478     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.22472     Document Type: Article

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