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Volumn 32, Issue 3, 1989, Pages 247-251
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Numerical and experimental comparison of 60 V vertical double-diffused MOSFETs and MOSFETs with a trench-gate structure
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Author keywords
[No Author keywords available]
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Indexed keywords
MATHEMATICAL TECHNIQUES--NUMERICAL ANALYSIS;
SEMICONDUCTOR MATERIALS--DOPING;
DMOSFET;
DRIFT REGION DOPING;
TRENCH-GATE STRUCTURE MOSFETS;
UMOSFET;
VERTICAL DOUBLE-DIFFUSED MOSFETS;
SEMICONDUCTOR DEVICES, MOSFET;
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EID: 0024629947
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/0038-1101(89)90099-3 Document Type: Article |
Times cited : (7)
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References (10)
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