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Volumn 32, Issue 3, 1989, Pages 247-251

Numerical and experimental comparison of 60 V vertical double-diffused MOSFETs and MOSFETs with a trench-gate structure

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL TECHNIQUES--NUMERICAL ANALYSIS; SEMICONDUCTOR MATERIALS--DOPING;

EID: 0024629947     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1101(89)90099-3     Document Type: Article
Times cited : (7)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.