A new self-aligning process for whole-wafer tunnel junction fabrlcation

IEEE Transactions on Magnetics

Volumn 25, Issue 2, 1989, Pages 1123-1126

  Hasko, D G ^b   Evetts, J E ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; SEMICONDUCTOR DEVICES--TUNNELING;

JUNCTION AREA; PLANAR TUNNEL JUNCTIONS; SELF-ALIGNING WHOLE-WAFER; SELF-ALIGNING WHOLE-WAFER PROCESS; WHOLE-WATER TUNNEL JUNCTION;

SUPERCONDUCTING DEVICES;

EID: 0024628366     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/20.92487     Document Type: Article

References (9)

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