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Journal of Materials Science

Volumn 24, Issue 1, 1989, Pages 192-198

Preparation of VO2 films by organometallic chemical vapour deposition and dip-coating

(5) Takahashi, Yasutaka a Kanamori, Masaaki a Hashimoto, Hiroyuki b Moritani, Yoshimitsu b Masuda, Yoshihiro b

a GIFU UNIVERSITY (Japan)

b MITSUI CHEMICALS INC (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TREATMENT--ANNEALING; MICROSCOPIC EXAMINATION--SCANNING ELECTRON MICROSCOPY; X-RAY ANALYSIS;

DIP COATING; METAL-SEMICONDUCTOR TRANSITION TEMPERATURE; ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION; SOL-GEL PROCESS; X-RAY DIFFRACTION;

VANADIUM COMPOUNDS;

EID: 0024303774 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/BF00660953 Document Type: Article

Times cited : (58)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.