Thermally Developable, Positive Tone, Oxygen RIE Barrier Resist for Bilayer Lithography

Journal of the Electrochemical Society

Volumn 136, Issue 1, 1989, Pages 245-249

  Ito, Hiroshi ^a   Ueda, Mitsuru ^a   Renaldo, Alfred F ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALDEHYDES--POLYMERIZATION; LITHOGRAPHY--PHOTOLITHOGRAPHY; POLYMERS--SYNTHESIS;

POLYPHTHALALDEHYDE DERIVATIVES; REACTIVE ION ETCH; TRIPHENYLSULFONIUM TRIFLATE;

PHOTORESISTS;

EID: 0024302906     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2096595     Document Type: Article

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