Hood ionization in semiconductor wafer processing: an evaluation

Electrical Overstress/Electrostatic Discharge Symposium Proceedings

Volumn , Issue , 1988, Pages 195-200

  Murray, K D ^a   Ainsworth, G F ^a   Gross, V P ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES--STATIC ELECTRICITY; ELECTROSTATICS;

ELECTROSTATIC DISCHARGE (ESD); FOREIGN MATERIAL MONITORING; HOOD IONIZATION; NEUTRALIZATION TIMES; RESIDUAL STATIC ELECTRICITY; SEMICONDUCTOR WAFER PROCESSING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0024172898     PISSN: 07395159     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)