Plasma polymerization of methyl methacrylate: a photoresist for 3D applications.

Volumn , Issue , 1988, Pages 9-12

  Guckel, Henry ^a   Uglow, Jay ^a   Lin, Ming ^a   Denton, Denice ^a   Tobin, Jeff ^a   Euch, Kathleen ^a   Juda, Michael ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY -- PHOTOLITHOGRAPHY; PLASMAS -- APPLICATIONS; POLYMERIZATION; POLYMETHYL METHACRYLATE -- APPLICATIONS; SENSORS -- FABRICATION;

DEEP UV PHOTORESIST; LIGHT-SENSITIVE POLYMER FILM; PHORORESIST STABILITY; PHOTOSENSITIVITY; PLASMA POLYMERIZATION;

PHOTORESISTS;

EID: 0024139035     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)