A magnetron sputter ion plating system

Surface and Coatings Technology

Volumn 36, Issue 3-4, 1988, Pages 901-907

  Teer, D G ^a  

^a TEER COATINGS LTD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES--APPLICATIONS; COATINGS--MECHANICAL PROPERTIES; SPUTTERING--APPLICATIONS; TITANIUM COMPOUNDS--APPLICATIONS;

HARD COATINGS; ION PLATING; TITANIUM NITRIDE;

CUTTING TOOLS;

EID: 0024135945     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(88)90030-8     Document Type: Article

References (16)

1. Physical vapor deposition of thick Cr and its carbide and nitride films by hollow-cathode discharge
2. Tubular hollow cathode sputtering onto substrates of complex shape
3. Charged particle fluxes from planar magnetron sputtering sources
4. Titanium aluminum nitride films: A new alternative to TiN coatings
5. Electrochemically measured porosity of magnetron sputtered TiN films deposited at various substrate orientations
6. MICROHARDNESS MEASUREMENT AS A QUALITY CONTROL TECHNIQUE FOR THIN, HARD COATINGS