A structural study of rapidly quenched glasses in the system Li2OSiO2

Journal of Non-Crystalline Solids

Volumn 106, Issue 1-3, 1988, Pages 77-80

  Umesaki, Norimasa ^a   Iwamoto, Nobuya ^a   Tatsumisago, Masahiro ^b   Minami, Tsutomu ^b  

^a OSAKA UNIVERSITY   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TREATMENT--QUENCHING; X-RAY ANALYSIS;

COORDINATION NUMBER; INTERATOMIC DISTANCE; RAMAN SCATTERING; RAPID QUENCHING; X-RAY DIFFRACTION;

GLASS, METALLIC;

EID: 0024125203     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(88)90232-3     Document Type: Article

References (16)

1. Rapid Quenching Technique Using Thermal-Image Furnace for Glass Preparation
2. Yogyo-Kyokai-Shi
3. Molecular dynamics simulation of Li4SiO4 melt and glass
4. Die Kristallstruktur des Lithiummetasilikates, (Li2SiO3)x
5. Untersuchungen an Schichtsilikaten des FormeltypsAm(Si2O5)n. I. Die Kristallstruktur der Zimmertemperaturform des Li2Si2O5