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Volumn 35, Issue 12, 1988, Pages 2424-2426

High-Temperature Latchup Characteristics in VLSI CMOS Circuits

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC CIRCUITS; OSCILLATORS; SEMICONDUCTOR DEVICES, MOS;

EID: 0024122580     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.8826     Document Type: Article
Times cited : (22)

References (7)
  • 1
    • 0021377786 scopus 로고
    • Temperature dependence of latchup in CMOS circuits
    • Feb.
    • J. G. Dooley and R. C. Jaeger, “Temperature dependence of latchup in CMOS circuits,” IEEE Electron Device Lett., vol. EDL-5, no. 2, pp. 41–43, Feb. 1984.
    • (1984) IEEE Electron Device Lett. , vol.EDL-5 , Issue.2 , pp. 41-43
    • Dooley, J.G.1    Jaeger, R.C.2
  • 3
    • 0038185073 scopus 로고
    • The physics and modeling of latch-up and CMOS integrated circuits
    • Ph.D. dissertation, Stanford Univ., Oct.
    • D. B. Estreich, “The physics and modeling of latch-up and CMOS integrated circuits,” Ph.D. dissertation, Stanford Univ., Oct. 1980.
    • (1980)
    • Estreich, D.B.1
  • 4
    • 84876716278 scopus 로고
    • Design considerations in high temperature analog CMOS integrated circuits
    • Sept.
    • F. S. Shoucair, “Design considerations in high temperature analog CMOS integrated circuits,” IEEE Trans. Components, Hybrids, Manufact. Technol., vol. CHMT-9, no. 3, pp. 242–251, Sept. 1986.
    • (1986) IEEE Trans. Components, Hybrids, Manufact. Technol. , vol.CHMT-9 , Issue.3 , pp. 242-251
    • Shoucair, F.S.1
  • 5
    • 0041654381 scopus 로고
    • High temperature diffusion leakage current dependent MOSFET small signal conductance
    • Dec.
    • F. S. Shoucair and J. M. Early, “High temperature diffusion leakage current dependent MOSFET small signal conductance,” IEEE Trans. Electron Devices, vol. ED-31, no. 12, pp. 1866–1872, Dec. 1984.
    • (1984) IEEE Trans. Electron Devices , vol.ED-31 , Issue.12 , pp. 1866-1872
    • Shoucair, F.S.1    Early, J.M.2
  • 6
    • 0021387284 scopus 로고
    • Electrical characteristics of LSI silicon MOSFETs at very high temperatures, Part III: Modeling and circuit behavior
    • Mar.
    • F. S. Shoucair, W. Hwang, and P. Jain, “Electrical characteristics of LSI silicon MOSFETs at very high temperatures, Part III: Modeling and circuit behavior,” IEEE Trans. Components, Hybrids, Manufact. Technol., vol. CHMT-7, no. 1, pp. 146–153, Mar. 1984.
    • (1984) IEEE Trans. Components, Hybrids, Manufact. Technol. , vol.CHMT-7 , Issue.1 , pp. 146-153
    • Shoucair, F.S.1    Hwang, W.2    Jain, P.3
  • 7
    • 0020087475 scopus 로고
    • Electron and hole mobilities in silicon as a function of concentration and temperature
    • Feb.
    • N. D. Arora, J. R. Hauser, and D. J. Roulston, “Electron and hole mobilities in silicon as a function of concentration and temperature,” IEEE Trans. Electron Devices, vol. ED-29, no. 2, pp. 292–295, Feb. 1982.
    • (1982) IEEE Trans. Electron Devices , vol.ED-29 , Issue.2 , pp. 292-295
    • Arora, N.D.1    Hauser, J.R.2    Roulston, D.J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.