메뉴 건너뛰기




Volumn 67, Issue 6, 1988, Pages 155-174

Synthesis of High‐Quality Ultra‐Thin Gate Oxides for ULSI Applications

(2)  Roy, Pradip K a   Sinha, Ashok K a  

a NONE

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; OXIDES--THIN FILMS; SILICA--THIN FILMS;

EID: 0024108368     PISSN: 87562324     EISSN: 15387305     Source Type: Journal    
DOI: 10.1002/j.1538-7305.1988.tb00072.x     Document Type: Article
Times cited : (20)

References (33)
  • 2
    • 0014800514 scopus 로고
    • “Cleaning Solutions Based on Hydrogen Peroxide for Use in Silicon Semiconductor Technology,”
    • (1970) RCA Review , vol.31 , pp. 187
    • Kern, W.1    Puotinen, D.A.2
  • 5
    • 84977303817 scopus 로고
    • “A 100A Thick Stacked SiO2/Si3N4/SiO2 Dielectric Layer for Memory Capacitors,” Proceedings of the International Reliability Physics Symposium, Orlando
    • (1985) , pp. 18
    • Watanabe, T.1
  • 8
    • 84977292519 scopus 로고
    • “Semiconductor Device with Low Defect Density Oxide,” Application for U. S. Patent, Serial No. 138,633
    • (1987)
    • Roy, P.K.1
  • 9
    • 84977286657 scopus 로고
    • “Thermally Prepared SiO2 Films for VLSI,” Semiconductor International
    • (1985) , pp. 92
    • Irene, E.A.1
  • 13
    • 84977302233 scopus 로고
    • “Technique for Reducing Substrate Warpage Spring‐back Using a Polysilicon Subsurface Strained Layer,” U. S. Patent No. 4,631,804
    • (1986)
    • Roy, P.K.1
  • 14
    • 84858477163 scopus 로고
    • S. T. Pentelides, Editor, Chaps. VI and VII, Pergamon Press, New York
    • (1978) 2 and Its Interfaces
  • 18
    • 84977280701 scopus 로고
    • “Trends in Automated Diffusion Furnace Systems for Large Wafers,” Solid State Technology
    • (1984) , pp. 105
    • Malaikal, J.C.1
  • 19
    • 84977305038 scopus 로고
    • “Process and Equipment Issues in Rapid Thermal Processing of Electronic Materials,” Rapid Thermal Processing of Electronic Materials et al., Syd R. Wilson, editors, MRS Symposium Proceedings, Vol. 92
    • (1987) , pp. 95
    • Mehta, S.1    Hodul, D.2
  • 30
    • 84977303750 scopus 로고
    • “Characterization of Si/SiO2 Interfaces Using Transmission Electron Microscopic Lattice Imaging and X‐Ray Microdiffraction Techniques,” MRS Fall Symposium, Boston
    • (1988)
    • Roy, P.K.1    Kannan, V.C.2
  • 31
    • 84977288675 scopus 로고
    • “Technology for the Fabrication of IMB CMOS DRAM,” International Electron Devices Meeting Technical Digest, Washington, D.C.
    • (1985) , pp. 698
    • Yaney, D.S.1
  • 33
    • 84977298775 scopus 로고
    • “Synthesis and Characterization of Ultra Thin Gate Oxides for VLSI/ULSI Circuits,” International Electron Devices Meeting Technical Digest, San Francisco, 1114
    • (1988)
    • Roy, P.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.