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Volumn 135, Issue 11, 1988, Pages 2803-2807
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Conditions for Thermal Nitridation of Si in N2-O2 Mixtures
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Author keywords
[No Author keywords available]
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Indexed keywords
HEAT TREATMENT--NITRIDING;
SILICON AND ALLOYS--HEAT TREATMENT;
THERMODYNAMICS;
ACTIVE OXIDATION;
STABILITY FIELD DIAGRAMS;
THERMAL NITRIDATION;
INTEGRATED CIRCUITS, VLSI;
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EID: 0024105064
PISSN: 00134651
EISSN: 19457111
Source Type: Journal
DOI: 10.1149/1.2095436 Document Type: Article |
Times cited : (22)
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References (23)
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