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Volumn 9, Issue 9, 1988, Pages 460-463

Increased Drain Saturation Current in Ultrathin Silicon-on-Insulator (SOI) MOS Transistors

Author keywords

[No Author keywords available]

Indexed keywords

TRANSISTORS, FIELD EFFECT;

EID: 0024072715     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.6945     Document Type: Article
Times cited : (73)

References (9)
  • 2
    • 0022700996 scopus 로고
    • Subthreshold slope of thin-film SOI MOSFET's
    • J.-P. Colinge, “Subthreshold slope of thin-film SOI MOSFET's”, IEEE Electron Device Lett., vol. EDL-7, pp. 247-276, 1986.
    • (1986) IEEE Electron Device Lett. , vol.EDL-7 , pp. 247-276
    • Colinge, J.-P.1
  • 3
    • 0023438606 scopus 로고
    • Hot-electron effects in silicon-on-insulator n-channel MOSFET's
    • J.-P. Colinge, “Hot-electron effects in silicon-on-insulator n-channel MOSFET's”, IEEE Trans. Electron Devices, vol. ED-34, pp. 2173-2177, 1986.
    • (1986) IEEE Trans. Electron Devices , vol.ED-34 , pp. 2173-2177
    • Colinge, J.-P.1
  • 5
    • 0019048875 scopus 로고
    • Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces
    • S. C. Sun and J. D. Plummer, “Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces”, IEEE Trans. Electron Devices, vol. ED-27, pp. 1497-1508, 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 1497-1508
    • Sun, S.C.1    Plummer, J.D.2
  • 6
    • 0022149344 scopus 로고
    • Transconductance of silicon-on-insulator (SOI) MOSFET's
    • J.-P. Colinge, “Transconductance of silicon-on-insulator (SOI) MOSFET's”, IEEE Electron Device Lett., vol. EDL-6, pp. 573-575, 1985.
    • (1985) IEEE Electron Device Lett. , vol.EDL-6 , pp. 573-575
    • Colinge, J.-P.1
  • 7
    • 0010030275 scopus 로고
    • High temperature annealing of SIMOX layers: Physical mechanisms of oxygen segregation
    • J. C. Sturm, C. K. Chen, L. Pfeiffer, and P. L. F. Hemment, Eds.
    • C. Jaussaud, J. Margail, J. Stoemenos, and M. Bruel, “High temperature annealing of SIMOX layers: Physical mechanisms of oxygen segregation”, in Proc. Symp. Mat. Res. Soc., vol. 107, J. C. Sturm, C. K. Chen, L. Pfeiffer, and P. L. F. Hemment, Eds., 1988 pp. 17-28.
    • (1988) Proc. Symp. Mat. Res. Soc. , vol.107 , pp. 17-28
    • Jaussaud, C.1    Margail, J.2    Stoemenos, J.3    Bruel, M.4
  • 9
    • 0039740033 scopus 로고
    • A charge based model for SOI MOSFET's
    • H. K. Lim and J. G. Fossum, “A charge based model for SOI MOSFET's”, IEEE Trans. Electron Devices, vol. ED-32, pp. 446-457, 1985.
    • (1985) IEEE Trans. Electron Devices , vol.ED-32 , pp. 446-457
    • Lim, H.K.1    Fossum, J.G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.