Novel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base-Developable Resist

Journal of the Electrochemical Society

Volumn 135, Issue 9, 1988, Pages 2328-2333

  Ito, Hiroshi ^a   Flores, Elizabeth ^a   Renaldo, Alfred F ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

POLYMERS--APPLICATIONS;

DRY ETCH RESISTANT, BASE-DEVELOPABLE RESIST; ONIUM SALTS; POLYMERIC DISSOLUTION INHIBITOR; POLYPHTHALALDEHYDE; TRIARYLSULFONIUM METAL HALIDES;

PHOTORESISTS;

EID: 0024071179     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2096264     Document Type: Article

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